Sputtering Tungsten Targets Close Grain For LCD Panel
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Sputtering Tungsten Targets Close Grain For LCD Panel 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used in aerospace industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the target...
Fonlink Photoelectric (Luoyang) Co., ltd
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High Purity 99.97% Tungsten Target Ground Surface Condition For Sputtering Coating
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... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been...
Luoyang Hypersolid Metal Tech Co., Ltd
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3410±20℃ Tungsten Products Target For Vacuum Sputtering Coating Tungsten Target Tungsten Round Plate Target W Plate
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Tungsten Target For Vacuum Sputtering Coating 1. Description Of Tungsten Target For Vacuum Sputtering Coating: What is a tungsten target? It is also known as tungsten sputtering target. It is a product made of pure tungsten powder as raw material. Its ......
Shaanxi Peakrise Metal Co.,Ltd
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Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters
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Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its ......
JINXING MATECH CO LTD
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Custom Metal Sputtering Cathode Target Featuring Superior Conductivity and Uniform Thickness for Industrial Coating Processes
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...Sputtering Target is a critical component widely used in the field of thin film deposition technologies, particularly in Physical Vapor Deposition (PVD) processes. As a high-quality Metal Sputtering Cathode Target, it is designed to deliver exceptional performance and reliability in various industrial and research applications. This product serves as the source material......
Baoji City Changsheng Titanium Co.,Ltd
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Non Toxic Tungsten Metal Alloy Round Ta W Tantalum Tungsten Target
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...Tungsten Metal Alloy Round Ta W Tantalum Tungsten Target Purity: TA-2.5W (99.75% tantalum, 2.5% tungsten) TA-7.5W (99.25% pure tantalum, 7.5% pure tungsten) TA-10W (99% pure tantalum, 10% pure tungsten) Product name tantalum tungsten target Material tantalum tungsten......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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High Resilience Sputtering Titanium Targets OD153*11
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Titanium target Gr2 ASTM B381-06 a OD153*11 Sputtering Target Sputtering Materials Target Sputtering Item Name Titanium target Grade Gr2 Material Titanium Packaging Vacuum package in wooden case Port of delivery Xi'an port, Beijing port, Shanghai port, ......
Baoji Feiteng Metal Materials Co., Ltd.
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Ceramic Sputtering Target Cadmium sulfide target material
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Ceramic Sputtering Target Product Introduction: Various ceramic target materials produced by vacuum hot pressing sintering method have advanced technology and mature production processes. The products are mainly used in thin belly solar cells Energy, flat ......
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Ta Sputtering Titanium Target Sheet 99.95% Purity Semiconductor Optical Coatings
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... target, thickness x width x length = 5 ～ 25x≤800x≤2000 (mm) Grain size: Recrystallization degree ≥98%, average grain size <......
Baoji Lihua Nonferrous Metals Co., Ltd.
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HXA-1602 160KV Tungsten Target X-ray Tube 0.8mm Focus Industrial NDT Tube
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HXA-1602 160KV Tungsten Target X-ray Tube 0.8mm Focus Industrial NDT Tube Technical Parameters Tube voltage 160KV Tube current 2mA Focus size 0.8*0.8 Filament current 4A Filament voltage 5V Target angle 25 o Target W Shape...
HUATEC GROUP CORPORATION
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