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Bordered Single Layer Capacitor 10pF 100V Low ESR Capacitor TiW-Au Metallization

Categories Single Layer Capacitor
Equivalent Series Resistance (ESR): <0.1 Ω @ 1 GHz
Gate Length: 1 µm
Dielectric Material Type: Class I (COG/NPO) / Class II (X7R)
Substrate Type: P-type Silicon
Place of Origin: china
Brand Name: Hoan
MOQ: 10
Temperature Range: -40 to 125 °C
Payment Terms: L/C,D/P,D/A,T/T,
Wire Bond Pull Strength: >3.0 grams (meets MIL-STD-883)
Dielectric Withstanding Voltage (DWV): 250% of Rated Voltage (100V → 250V)
Model Number: HACC100S10V101
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Bordered Single Layer Capacitor 10pF 100V Low ESR Capacitor TiW-Au Metallization

HACC100S10V101 Bordered Single Layer Ceramic Chip Capacitor (10pF,100V)


What is a Single-Sided Bordered (Margin) Single Layer Capacitor?

In high-density microwave hybrid integrated circuits (ICs), engineers face a common assembly challenge: during die attachment, conductive silver epoxy (such as H20E) can bleed out, creep up the sides of the chip capacitor, and bridge with the top electrode, causing a catastrophic short circuit.

The HACC100S10V101 resolves this with its Single-Sided Bordered (Margin) Design. As shown in the product image, the top surface consists of a central high-purity gold electrode (TiW-Au) surrounded by a precise, un-metallized dark ceramic border (Margin). This exposed ceramic frame acts as a physical barrier, effectively blocking any epoxy bleed-out from contacting the active top electrode, guaranteeing zero-defect bonding during automated assembly.


Material & Thin-Film Metallization Structure
The HACC100S10V101 features a premium, multi-layer thin-film metallization system to ensure long-term reliability under severe thermal and mechanical stresses:

•Top Electrode: TiW-Au (Titanium-Tungsten / Gold) with an overall gold thickness of ≥ 2.5 µm Min. This thick, high-purity gold layer is optimized for high-reliability thermosonic gold wire bonding (Au wire-bonding).
•Bottom Electrode: TiW-Pt-Au (Titanium-Tungsten / Platinum / Gold) with an overall thickness of ≥ 2.5 µm Min. The inclusion of a Platinum (Pt) barrier layer prevents silver-to-gold intermetallic migration when using silver conductive epoxies, ensuring maximum adhesion.


Dimensions


Technical Specifications (HACC100S10V101)

Technical ParameterSpecification ValueTest/Environmental Conditions
Part NumberHACC100S10V101
Capacitor StyleSingle Layer Ceramic Chip(SLC)Single-sided bordered (Margin) type
Capacitance10 pF±10%Measured @ 1kHz, 1Vrms, 25°C, No DCBias
Rated Voltage100VDCHigh-voltage reliability margin
Operating Temp. Range-55°Cto +125°CFully complies with Tactical-gradestandards
Top Metallization SystemTiW-Au (Au > 2.5 um Min)Solderable & Wire-bondable
Bottom MetallizationSystemTiW-Pt-Au (Au > 2.5 um Min)Excellent conductive epoxy compatibility
Frequency CapabilityOptimized for GHz BandUltra-low ESR and ESL at microwave bands

Assembly & Gold Wire Bonding Best Practices

To achieve an optimal assembly yield when integrating the HACC100S10V101 into your RF modules:

1.Conductive Epoxy Die-Attach:
•Mounting with conductive silver epoxy (e.g., H20E) is highly recommended.
•Recommended Baking/Curing Profile: Bake at 120℃ for 30 minutes to ensure robust mechanical and electrical attachment.
2.Gold Wire Bonding Wedge Margin:
•To prevent micro-cracking of the ceramic or delamination of the gold film during thermosonic wire-bonding, the bonding ball/wedge must be placed at least 25 µm away from the outer edge of the gold pad.
3.Die Placement Force:
•Keep the pick-and-place nozzle force controlled to prevent localized stress on the single-layer ceramic body.


Typical High-Frequency Microwave Applications
•5G & 6G Millimeter-Wave (mmWave) Small Cells
•Optoelectronic Transceivers (100G/400G SFP/QSFP Modules)
•GaAs, GaN & InP High-Power RF Amplifiers (Bypass & Decoupling)
•LNA (Low Noise Amplifier) DC Blocking Circuits
•Satellite Communications (Satcom) and Tactical Avionics


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