vacuum molybdenum sputtering target

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Model Number:Mo1 Molybdenum Plate

... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed.

Brand Name:JINXING

Model Number:Molybdenum Round Target

Place of Origin:China

...Molybdenum Round Target ​Description Pure Molybdenum Round Target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. Features of Molybdenum Round Target 1. Thin-film deposited from molybdenum sputtering target is high in density and adhesion; 2. Molybdenum...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Brand Name:FGD

Model Number:fgd t-001

Place of Origin:China

1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ...

Brand Name:CSTI

Model Number:20221010

Place of Origin:China

...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum...

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Categories:Sputtering Target

Country/Region:china

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for

Place of Origin:Zhaoqing, Guangdong

Brand Name:Zhongda

... operates by ionizing a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film.

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:JXS

Place of Origin:China

Plastic PVD Sputtering Coating Machine/Vacuum Magnetron Sputtering Coating Equipment Glass Color Pvd Vacuum Plating PVD coating machines are essential in numerous industries. In the manufacturing sector, they are used to apply wear-resistant coatings on ...

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:CHINA

Main Features 1).High deposition rates (~1-3 µm/h) 2).High ionisation, resulting in good adhesion and dense coatings 3).As the target is cooled, little heat to the substrate is generated, i.e. even coating at temperatures below 100°C is possible 4).Several...

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:DST

Model Number:MCA-850s

Place of Origin:China Hefei

... Vacuum Coating Equipment CPP Substrate This machine is generally used for one color roll paper flexo printing (70-25gsm) and self-...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...