vacuum melting sputtering targets

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Brand Name:Jinxing

Model Number:TiAl Ti70Al30 Sputtering Targets

Place of Origin:China

...Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc. Ti, Cr, Zr, TiAl, Ni, Cu, Stainless Steel, etc. Cr and TiAl targets...

Brand Name:Changsheng

Model Number:ASTM

Place of Origin:China

...Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4.5 g/cm³), and excellent corrosion resistance. It has a melting point of 1660°C and a vapour pressure of 10⁻⁴ Torr at 1,453°C, making it ideal for high-temperature and high-vacuum...

Brand Name:Baidun

Place of Origin:China

Model Number:VM-EG400

Vacuum Melting Electronic Grade Copper SiC Graphite Crucible Ultra-high purity crucible for vacuum melting of 6N (99.9999%) electronic grade copper used in semiconductor sputtering targets. Minimal outgassing and zero contamination design.Key Features Vacuum compatible ultra-low outgassing 6N purity retention capability Semiconductor grade material quality Clean melting for target...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Categories:Sputtering Target

Country/Region:china

...sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal films, semiconductor films, and special functional coatings. The product is made from high-purity samarium metal through precision melting, forming, and processing. It features a high melting...

Brand Name:Hypersolid Metal

Place of Origin:China

... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The

Brand Name:PRM

Model Number:custom

Place of Origin:China

... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

Silicon Dioxide Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220...

Place of Origin:Zhaoqing, Guangdong

Brand Name:Zhongda

... operates by ionizing a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film.

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:JXS

Place of Origin:China

Plastic PVD Sputtering Coating Machine/Vacuum Magnetron Sputtering Coating Equipment Glass Color Pvd Vacuum Plating PVD coating machines are essential in numerous industries. In the manufacturing sector, they are used to apply wear-resistant coatings on ...

Brand Name:High Broad

Model Number:Hf sputtering targets

Place of Origin:China

... to your request Available size Normal size:2*5mm,3*3mm,6*6mm Certificates ISO9001:2008, SGS,The third test report Technics Vacuum Melting, Patented thermo-mechanical process Application Widely used in coating processing industries A: Magnetic Data Storage

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:CHINA

Main Features 1).High deposition rates (~1-3 µm/h) 2).High ionisation, resulting in good adhesion and dense coatings 3).As the target is cooled, little heat to the substrate is generated, i.e. even coating at temperatures below 100°C is possible 4).Several...

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...