sputtering tungsten target

Brand Name:Sifon

Model Number:tungsten target

Place of Origin:China

Sputtering Tungsten Targets Close Grain For LCD Panel 1. Product Details: 1. high purity, ≥99.95% 2. high density, 99% or higher 3. O content less than 20ppm It's widely used in aerospace industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the target

Model Number:Tungsten Target

... spectrometry (GDMS), and inductively coupled plasma (ICP); 2. Tungsten target from Achemetal is provided with high purity up to 99.97%, density 18.8-19g/cm3, homogeneous organization structure, and fine grain; 3. Our tungsten sputtering target has been

Brand Name:PRM

Model Number:custom

Place of Origin:China

Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets...

Brand Name:JINXING

Model Number:Chromium Sputter Coater Targets

Place of Origin:China

Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its ...

Brand Name:Feiteng

Model Number:Titanium target

Place of Origin:Baoji, Shaanxi, China

Titanium target Gr2 ASTM B381-06 a OD153*11 Sputtering Target Sputtering Materials Target Sputtering Item Name Titanium target Grade Gr2 Material Titanium Packaging Vacuum package in wooden case Port of delivery Xi'an port, Beijing port, ...

Brand Name:Changsheng

Model Number:ASTM F67,ASTM F136 ASTM B381

Place of Origin:China

...Description: The Metal Sputtering Target is a critical component widely used in the field of thin film deposition technologies, particularly in Physical Vapor Deposition (PVD) processes. As a high-quality Metal Sputtering Cathode Target, it is designed to ...

Brand Name:Forged

Model Number:customized

Place of Origin:Luoyang Henan, China

...Tungsten Metal Alloy Round Ta W Tantalum Tungsten Target Purity: TA-2.5W (99.75% tantalum, 2.5% tungsten) TA-7.5W (99.25% pure tantalum, 7.5% pure tungsten) TA-10W (99% pure tantalum, 10% pure tungsten) Product name tantalum tungsten target Material tantalum tungsten...

Brand Name:LHTI

Model Number:Ta target

Place of Origin:China

... target, thickness x width x length = 5 ～ 25x≤800x≤2000 (mm) Grain size: Recrystallization degree ≥98%, average grain size <...

Brand Name:HUATEC

Model Number:HXA-1602

Place of Origin:China

HXA-1602 160KV Tungsten Target X-ray Tube 0.8mm Focus Industrial NDT Tube Technical Parameters Tube voltage 160KV Tube current 2mA Focus size 0.8*0.8 Filament current 4A Filament voltage 5V Target angle 25 o Target W Shape

Brand Name:KYKY

Model Number:SBC-12

Place of Origin:China

Ion Sputtering instrument , SBC-12 , Target available for Au , Ag , Cu , Al This device is primarily designed for coating of conductive films on SEM samples.Easy operation, cost-effectiveness, androbust durability, making it an indispens able tool for ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Categories:Sputtering Target

Country/Region:china

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

...required vacuum environment for magnetron sputtering coating 2.Magnetron sputtering system : Including magnetron sputtering cathodes, targets, etc. 3.Automatic Control System : Fully automatic process control by computer or PLC control 4.Other ...

Brand Name:JXS

Place of Origin:China

...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target...

Brand Name:Ze Xu

Model Number:based on customer's needs

Place of Origin:Yanshan, Hebei, China

Sputtering Aluminum Target Plate For Steam Purge Test In Power Plant After the pipeline system is installed, air or steam can be used to blow it according to the working conditions of its working medium and the degree of contamination of the inner surface...