nickel vanadium metal sputtering target

Brand Name:CSTI

Model Number:20221010

Place of Origin:China

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel...

Brand Name:APG

Place of Origin:china

...rigorous high-vacuum and high-temperature conditions, these targets maintain their integrity, facilitating the deposition of dense, uniform, and highly adherent functional thin films for advanced technological applications. Ytterbium Sputtering Target’s

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ...

Categories:Sputtering Target

Country/Region:china

... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan.

Brand Name:TOBO

Place of Origin:CHINA

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...

Brand Name:ZHENAN

Model Number:Pure Tungsten Metal Sputtering Target

Place of Origin:China

...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets...

Brand Name:Hypersolid Metal

Place of Origin:China

... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port...

Brand Name:JB

Place of Origin:Guangdong, China

Product Description Specification item value Place of Origin China Brand Name JB FAQ 1. who are we? We are based in Guangdong, China, start from 2022,sell to Domestic Market(50.00%),South Asia(50.00%),Southern Europe(50.00%),Northern Europe(50.00%),Central...

Categories:oxide metal and others targets

Country/Region:china

... ≥1mm) Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm) Nickel Oxide (NiO) Evaporation Material Purity--- 99.5%, 99.9% Refractive Index---2-2.1 Transparence Wave Band----0.52um Shape---Ø10 ...

Model Number:Customized

Place of Origin:China

Brand Name:Sanhui

..., lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. It has a melting point of 1,857°C, a density of 7.2 g/cc, and a vapor pressure of 10-4 Torr at 1,...

Brand Name:Sifon

Model Number:5mm*W*L

Place of Origin:China

...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

... are cleaned via ion bombardment and heated.​ 3.Sputtering Process: Argon gas is injected into the chamber; high voltage ionizes argon into plasma. Under the action of a strong magnetic field, plasma ions are accelerated to bombard the sputtering target,

Brand Name:ROYAL

Model Number:RTSP1400

Place of Origin:Made in China

... evaporation source and magnetron sputtering cathodes source. Which is flexible for different mirrors application. Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The