metal molybdenum sputtering target

Brand Name:JINXING

Model Number:Molybdenum Round Target

Place of Origin:China

...Molybdenum Round Sputtering Target Metal For PVD Molybdenum is a silver-white metal, hard and tough, high melting point, high thermal conductivity,molybdenum has the advantages of high strength, high melting point, corrosion resistance, wear resistance, etc., Molybdenum Sputtering Targets,Molybdenum round target,Tungsten Sputtering Targets Brand:Mo1,Mo3G,TZM Specification:According to the needs of users Molybdenum...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Sputtering Targets For The Semiconductor Industry 1. Description Of Molybdenum Sputtering Targets For The Semiconductor Industry: Molybdenum is a versatile refractory metal with outstanding mechanical qualities, a low coefficient of expansion, strong thermal conductivity, and exceptionally high electrical conductivity at high temperatures. There are numerous combinations that can be used as sputtering targets, including pure molybdenum

Brand Name:Hypersolid Metal

Place of Origin:China

... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The

Brand Name:APG

Place of Origin:china

Molybdenum targets, a rising star in high-performance materials With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation. Excellent Properties of Molybdenum Targets l Ultra-high Purity Molybdenum

Brand Name:FGD

Model Number:fgd t-001

Place of Origin:China

1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ...

Brand Name:CSTI

Model Number:20221010

Place of Origin:China

Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum...

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

.... It can be devided into pure non-ferrous metal target, pure titanium Ti, pure nickel Ni, chromium Cr, niobium Nb, aluminum Al, molybdenum Mo according to the material. In principle, all kinds of metals can be used as targets.The sputtering targets we can

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum...

Categories:Sputtering Target

Country/Region:china

... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan.

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:ZHENAN

Model Number:Pure Tungsten Metal Sputtering Target

Place of Origin:China

...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ...

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:JXS

Place of Origin:China

...Metal Film Sputtering Coating Machine Description: A PVD coating machine is a sophisticated piece of equipment used to apply thin, durable films onto various substrates. The process, Physical Vapor Deposition, occurs within a high-vacuum chamber. It involves converting a solid coating material, known as the target, into a vapor through physical means such as sputtering...

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...