al 35 tantalum sputtering target

Brand Name:Changsheng

Model Number:ASME B16.9

Place of Origin:China

Description PVD (Physical Vapour Deposition) sputtering targets are source materials used to deposit thin films on substrates through the sputtering process. These targets are made by processing high-purity metals or ceramics using advanced technologies...

Brand Name:PRM

Model Number:Custom

Place of Origin:China

Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, stains, burrs and other defects Standard ASTM B708 Shape Flat target, Rotating ...

Brand Name:Forged

Model Number:customized

Place of Origin:Luoyang Henan, China

tantalun target purity 99.95% customizable commodity outlet FeatureTM B708 tantalum sheet price per kg 1. Good ductility 2. Good plasticity 3. Excellent acid-resistance 4. High melting point, high boiling point 5. Very small coefficients of thermal ...

Brand Name:JX

Model Number:High Purity Titanium Aluminum Sputtering Target TiAl7030

Place of Origin:China

... Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application. Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%

Brand Name:LHTi

Model Number:Titanium Target

Place of Origin:Baoji, Shaanxi, China

.../70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V

Brand Name:ROYAL

Model Number:RTSP

Place of Origin:China

Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to ...

Brand Name:TOBO

Place of Origin:CHINA

Overview Essential details Place of Origin: China Type: Nickel Plate Application: electrical and electronic components Grade: monel Ni (Min): 63 Resistance (μΩ.m): Customzied Powder Or Not: Not Powder Ultimate Strength (≥ MPa): 517-655 Elongation (≥ %): 50...

Brand Name:Sanhui

Model Number:R05200 R05400 R05252

Place of Origin:Henan, China

... 5. Application Capacitors, high-temperature furnace parts, semiconductor, sputtering targets 6. Strict quality control System: Each link of the production will be strickly controled,ensuring without one un-qualified product being out from our company. 7.

Brand Name:KYKY

Model Number:SBC-12

Place of Origin:China

Ion Sputtering instrument , SBC-12 , Target available for Au , Ag , Cu , Al This device is primarily designed for coating of conductive films on SEM samples.Easy operation, cost-effectiveness, androbust durability, making it an indispens able tool for ...

Brand Name:MH

Model Number:MHT7263

Place of Origin:Baoji,China

...Resistance Titanium Alloy Pvd Target For Medical / Industrial Coating Specification: Item Name GR1 GR2 GR5 Titanium Alloy pvd Targets/Titanium Sputtering Targets for coating Material Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc ...

Brand Name:Zhongda

Place of Origin:Zhaoqing, Guangdong

... Ultimate Vacuum ≤ 8.0×10⁻⁵Pa (coating chamber) Deposition Rate 0.5-2.5μm/min (reactive/non-reactive processes) Target Compatibility Ti, Si, Cr, Al, ITO, Nb₂O₅, Si₃N₄ (Low-E, AR) Production Capacity Up to 1.6 million m²/year (single line,

Place of Origin:China

Ingredients: nickel 50 chromium 45 silicon 5wt% Production process: vacuum magnetic xuanhu furnace and HP hot pressing equipment We produce various proportions of Ni Cr, Ni Fe, Ni Mn, Ni Al, Ni Cu, Ni Ti and so on. The products are heated, forged and ...