10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Custom Metal Sputtering Cathode Target Featuring Superior Conductivity and Uniform Thickness for Industrial Coating Processes
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...Description: The Metal Sputtering Target is a critical component widely used in the field of thin film deposition technologies, particularly in Physical Vapor Deposition (PVD) processes. As a high-quality Metal Sputtering Cathode Target, it is designed to ......
Baoji City Changsheng Titanium Co.,Ltd
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Pvd Chromium Sputtering Target/Cr Sputtering Target/Chrome Target Price
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...Sputtering Target/Cr Sputtering Target/Chrome Target Price Cr Sputtering Target Information Purity: 99.5-99.95%; Circular: Diameter <= 14 inch, Thickness >= 1mm; Block: Length <= 32 inch, Width <= 12 inch, Thickness >= 1mm; Targets Type: Planar sputtering target, Rotary sputtering target......
JINXING MATECH CO LTD
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Custom Rare Earth Alloy Sputtering Target Tailored Composition for Your Thin Film Process
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...sputtering target is a high-performance functional material that can be precisely designed in composition and structure according to customer requirements. This product is prepared through advanced alloy melting, homogenization treatment, and precision processing techniques. It features precise composition control, dense and uniform structure, and excellent chemical uniformity and microstructural consistency in sputtered...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Titanium Grade 2 Grade 5 Sputtering Target Titanium Target Silver Target Sputtering To Coating
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...Sputtering Target Titanium Target Silver Target Sputtering to Coating Sputtering is a widely used deposition technique for creating thin films and coatings on various substrates. In this process, material from a sputtering target (usually in the form of a metal or alloy) is bombarded with high-energy ions in a vacuum, causing atoms to be ejected and deposit onto a surface. This results in the formation of a thin, uniform...
Baoji Lihua Nonferrous Metals Co., Ltd.
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High Quality Customized Archery Target Foam Target Board for Indoor/outdoor game
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Product descriptions PE foam Archery Target for Indoor/outdoor game 1.Material: XPE foam 2.Size: 50cm*50cm – 60cm*60cm or customized 3.Thickness: 5cm,10cm,15cm,20cm,25cm,30cm,35cm,40cm or customized 4.PE Foam– polyethylene foam 5.Is a kind of widely ......
CHANGZHOU TAIHUI SPORTS MATERIAL CO.,LTD
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Fine Uniform Thickness Film 3C Electronic Components Vacuum PVD Magnetron Sputtering Coating Equipment
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...Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target......
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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Molybdenum Disc Factory Moly Disc Vacuum Coating Molybdenum Sputtering Target High Temperature Resistance
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... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The...
Luoyang Hypersolid Metal Tech Co., Ltd
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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