TiAl Titanium Aluminum Alloy Sputtering Target
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TiAl Titanium Aluminum Alloy Sputtering Target This titanium aluminum alloy (TiAl) sputtering target is a lightweight PVD material with high purity, fine and uniform particle size and good formability. It is produced in several Ti/Al composition ratios and supplied in round shape with a polished surface, hot isostatically pressed and checked by ultrasonic testing. TiAl targets......
Baoji Lihua Nonferrous Metals Co., Ltd.
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PVD Titanium Alloy Sputtering Target
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...Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of the target material directly affect the quality, performance and cost-effectiveness of the film. PVD Titanium Alloy Sputtering Target PVD Titanium alloy sputtering Target is made of high quality titanium alloy......
JINXING MATECH CO LTD
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Aluminum Neodymium Alloy Sputtering Target for High-Quality Display & Touch Screen Electrode Coating
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...high-purity aluminum and neodymium through precision alloying processes, featuring uniform alloy composition and stable sputtering performance. The formed film effectively suppresses "hillock" growth in the electrode layer, improving electrode flatness and...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Indium Alloy Sputtering Target With Customized Substrates Polished And Anodized
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... substrate compatibility feature of this product is what sets it apart from other metal sputtering targets available in the market. With this feature, you can be assured that this product is compatible with your specific substrate material, ensuring a...
Baoji City Changsheng Titanium Co.,Ltd
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA
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High Purity Titanium Aluminum Sputtering Targets(TiAl Sputtering Targets)
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... target is made from high-purity aluminum and titanium alloy, combining the light weight and high reflection of aluminum with the high strength and corrosion resistance of titanium. It is suitable for physical vapor deposition (PVD), sputtering coating......
Shenzhen APG Material Company Limited
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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...Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum-copper alloys......
Shaanxi Peakrise Metal Co.,Ltd
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Tantalum Tungsten Alloy Square Tungsten Sputtering Target Hot Isostatic Pressing
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...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc Freight shipping According to the consumer’s demands. size customized pay attention heavy quantity is...
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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