PVD Titanium Alloy Sputtering Target
|
...Alloy Sputtering Target Description PVD coating technology physically converts a material from a solid state to a gaseous state, which is then deposited on a target substrate to form a thin film. The properties of the target material directly affect the quality, performance and cost-effectiveness of the film. PVD Titanium Alloy Sputtering Target PVD Titanium alloy sputtering Target is made of high quality titanium alloy......
JINXING MATECH CO LTD
|
Aluminum Scandium Alloy Sputtering Target for 5G Acoustic Filters with Enhanced Piezoelectric Performance
|
...alloy sputtering target is a high-performance rare earth alloy functional material specifically used for preparing aluminum nitride piezoelectric films for high-frequency filters. This product is made from high-purity aluminum and scandium through precision alloying processes, featuring uniform composition, stable sputtering performance, and excellent film......
Shanghai Sheeny Metal Mateirals Co.,Ltd.
|
Titanium Alumimum Alloy Sputtering Targets Ti Titanium Gr2 Gr5 to Successful Medical Applications
|
... advanced materials to enhance the performance, safety, and durability of medical devices. Among these materials, high purity titanium sputtering targets have gained significant importance due to their unique properties and versatility. This article will...
Baoji Lihua Nonferrous Metals Co., Ltd.
|
Indium Alloy Sputtering Target With Customized Substrates Polished And Anodized
|
Product Description: Our Metal Sputtering Target product boasts of a polished and anodized surface, providing you with a smooth and clean surface for your metal deposition process. The customized substrate compatibility feature of this product is what sets......
Baoji City Changsheng Titanium Co.,Ltd
|
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
|
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA
|
W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
|
...alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
|
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
|
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
|
PVD Arc Ion Molybdenum Tungsten Alloy Plate Target For Magnetron Sputtering Coating
|
...Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten-molybdenum alloy...
Shaanxi Peakrise Metal Co.,Ltd
|
PVD Arc Ion Molybdenum Tungsten Alloy Plate Target For Magnetron Sputtering Coating
|
|
...Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating 1. Information of Tungsten Molybdenum Alloy Plate Target For PVD: Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten-molybdenum alloy...
Shaanxi Peakrise Metal Co.,Ltd
|
GMR Films Gr2 Sputtering Tube Targets For Magneto Optical Disc
|
...Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Target Sputtering Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering......
Baoji Feiteng Metal Materials Co., Ltd.
|
Submit your “thin film alloy sputtering target” inquiry in a minute :