99.95% Pure Zirconium Sputtering Target Zr Sputtering Target for Optics Industry
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... coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions. Zirconium sputtering target is available in various forms, purities,...
JINXING MATECH CO LTD
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Gr1 Gr2 TiAl TiCr TiCu Cr Titanium Sputter Target For Coating Industry
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Gr1 Gr2 TiAl TiCr TiCu Titanium sputter target for coating industry Titanium targets/ titanium sputter target are widely used: when electronic components (such as common CD storage), semiconductor diodes, computer monitor liquid crystal film nanomaterials......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Ti Ti-Al Fe Cu Zr Cr Sputtering Targets For Semiconductors 100*40mm 95*45mm
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Description Sputtering targets are materials from which thin films are deposited using the sputtering method. These targets are fabricated from metals or ceramics through advanced processes such as melting, sintering, synthesis, and precision mechanical ......
Baoji City Changsheng Titanium Co.,Ltd
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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
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niobium target purity 99.95% merchandise on hand customization Niobium Target Introduction With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widely used in coating industry, electronics ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating
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Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, stains, burrs and other defects Standard ASTM B708 Shape Flat target, Rotating ......
Shaanxi Peakrise Metal Co.,Ltd
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10.22g/Cm3 Molybdenum Sputtering Target For Photoelectron And Semiconductor
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...Sputtering Targets For Photoelectron and Semiconductor Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum target is one kind of industrial......
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Silicon Dioxide Sputtering Target Fine Ground Surface Long Service Life High Precision
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...Sputtering Target The network structure of SiO2 determines its excellent physical and chemical properties. In addition, SiO2 is widely existed in nature and has been widely used by humans since ancient times.Silica and other compounds are fused at high temperatures and rapidly cooled to produce glass.It is also a major component of sand and quartz.It is the main raw material for semiconductor......
Yantai ZK Optics Co., Ltd.
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High Purity Planar Molybdenum Sputtering Target Plate Silver Color
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...Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors......
Luoyang Hypersolid Metal Tech Co., Ltd
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Ceramic Sputtering Target Cadmium sulfide target material
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.... The products are mainly used in thin belly solar cells Energy, flat panel display, optical coating, semiconductor, military and other fields. The company has cooperated with many well-known universities at home and abroad, committed to the research and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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