Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
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...Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target......
JINXING MATECH CO LTD
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Sputtering Target Chromium Cr 100x40mm Hot Isostatic Pressing
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...sputtering target material is produced by the advanced hot isostatic pressing (HIP) process. sputtering target include rectangular target, arc target, ring target and large aspect ratio integrally formed tube target, etc., with controllable purity and density, and fine and uniform grains , Long service life and other advantages. Purity: 99.5%~99.95%; Forming process: hot isostatic pressing(HIP......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Titanium Sputtering Target Medical PVD
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...Sputtering Target Medical PVD LHTi manufactures high purity PVD titanium sputtering targets from Grade 2 and Grade 5 titanium for medical coating applications. The targets are produced by advanced vacuum melting and HIP processing, so the material reaches 2N8 to 5N purity and gives a uniform, contamination-free coating layer on medical devices. Every target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Molybdenum Sputtering Target(Mo Sputtering Target)
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...Sputtering Target, a rising star in high-performance materials With the continuous advancement of material science, Molybdenum sputtering targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation. Excellent Properties of Molybdenum sputtering targets...
Shenzhen APG Material Company Limited
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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