Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets......
Baoji City Changsheng Titanium Co.,Ltd
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Ytterbium Rare Earth Metal Sputtering Targets(Yb Sputtering Targets)
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...rigorous high-vacuum and high-temperature conditions, these targets maintain their integrity, facilitating the deposition of dense, uniform, and highly adherent functional thin films for advanced technological applications. Ytterbium Sputtering Target’s...
Shenzhen APG Material Company Limited
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Zirconium Zr702 High Purity Metal Sputtering Targets
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ......
JINXING MATECH CO LTD
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ......
Gnee Steel (tianjin) Co., Ltd.
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Ytterbium Sputtering Target as Advanced OLED Cathode Layer for Brighter , Longer-Lasting Displays
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... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan....
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
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...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
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Multi Arc and Magnetron Sputtering PVD System for Advanced Multi-Layer Surface Coating
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... and Magnetron Sputtering PVD System for Advanced Multi-Layer Surface Coating Description Combined multi arc ion plating & magnetron sputtering PVD system. Capable of depositing advanced multi-layer decorative and functional thin films on metal, ceramic......
Foshan Jinxinsheng Vacuum Equipment Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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