Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel......
Baoji City Changsheng Titanium Co.,Ltd
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Ytterbium Rare Earth Metal Sputtering Targets(Yb Sputtering Targets)
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...rigorous high-vacuum and high-temperature conditions, these targets maintain their integrity, facilitating the deposition of dense, uniform, and highly adherent functional thin films for advanced technological applications. Ytterbium Sputtering Target’s...
Shenzhen APG Material Company Limited
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Zirconium Zr702 High Purity Metal Sputtering Targets
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High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ......
JINXING MATECH CO LTD
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W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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Ultra high purity tungsten alloy W-Ti sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and easy processing. The ......
Gnee Steel (tianjin) Co., Ltd.
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Ytterbium Sputtering Target as Advanced OLED Cathode Layer for Brighter , Longer-Lasting Displays
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... ytterbium metal through precision processing, featuring excellent film uniformity, high conductivity, and good sputtering stability. It can replace traditional magnesium and silver cathode materials to improve display device performance and lifespan....
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ......
TOBO STEEL GROUP CHINA
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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
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...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
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Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and...
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
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