Zirconium Sputtering Target For PVD Coating Systerm Decorative Coating
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Zirconium Sputtering Target Zirconium sputtering target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. Description Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf<300ppm or Hf<4.5%) Shape: Round Shape , Tube Shape and Plate Shape. Sizes: Plate sputtering targets......
JINXING MATECH CO LTD
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High Purity Zr Zirconium Sputtering Target Material Corrosion Resistance
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Zirconium targets are sputtering targets processed from high-purity zirconium (Zr) metal. They feature low hydrogen absorption, a high melting point (1855℃), excellent corrosion resistance, and good thermal conductivity. They are widely used in semiconductors, optical coatings, and functional coatings. Due to zirconium......
Shenzhen APG Material Company Limited
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Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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...zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium and other metal alloys, zirconium and zirconium......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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High Purity Zirconium Sputtering Target Zirconium Tube For Energy-Saving Glass
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Product Information: Name: High Purity Zirconium Sputtering Target Zirconium Tube For Energy-Saving Glass Grade: Zr2 Zr4 Zr702 Zr705 Zr60804 Zr60001 Zr60901 Density: 6.51g/cm3 Size: OD 6-127mm,WT 0.5-4.5mm,L <10meters Or process according to customer's ......
Shaanxi Peakrise Metal Co.,Ltd
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium......
Baoji City Changsheng Titanium Co.,Ltd
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Round Titanium Alloy Targets / Titanium Sputtering Targets For Coating
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...Targets/Titanium Sputtering Targets/Ti alloy target for coating Product name: Titanium Sputtering Target Materail: Pure Titanium Gr2 or titanium alloy Gr5 , Ti-Al , Ti-Cr, Ti-Zr etc. Other material: Chrome, Zirconium , Copper , tungsten etc. Shape: Round Dimensions: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T) ,can be customized Application: Coating industry, sputtering......
Baoji Lihua Nonferrous Metals Co., Ltd.
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CNC Processed Silicon Dioxide Sputtering Target Fine Grinding Surface
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Silicon Dioxide Sputtering Target With Fine Grinding Surface Processed By CNC Quartz glass SiO2 also called silica glass is a very important material for industry and research. Quartz glass, which has a low coefficient of thermal expansion similar to ......
Yantai ZK Optics Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High-Dielectric Lanthanum Sputtering Target for Leakage-Free Semiconductor Memory Chip Fabrication
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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