Aluminum Plate Sputtering Targets High Purity For Semiconductor Industry
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Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare large-scale high-purity aluminum plates with good surface and shape by hot rolling. The microstructure of high-purity aluminum plates annealed at different temperatures was studied. The results show that after annealing at 280 ℃ for 45 min and 55 min respectively, the as rolled aluminum......
JINXING MATECH CO LTD
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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TiAl Titanium Aluminum Alloy Sputtering Target For Coating Industry Rosegold Color
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... 33/67 40/60 45/55 50/50 Shape: Round target Size: Dia99x40 Dia160x12 Dia128x15 Dia105x16 Dia100x32 Dia64x32 Or as customer's requests Or as customer's requests Titanium aluminum alloy target characteristics: High purity, fine particle size,...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Mo1 Chrome Molybdenum Steel Plate ASTM B386 For Molybdenum Sputtering Target
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... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed....
Luoyang Hypersolid Metal Tech Co., Ltd
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum. Item Purity Density Coating color Shape Standard size Titanium Aluminum...
Baoji City Changsheng Titanium Co.,Ltd
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Aluminum Scandium Alloy Sputtering Target for 5G Acoustic Filters with Enhanced Piezoelectric Performance
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Aluminum scandium alloy sputtering target is a high-performance rare earth alloy functional material specifically used for preparing aluminum nitride piezoelectric films for high-frequency filters. This product is made from high-purity aluminum and scandium through precision alloying processes, featuring uniform composition, stable sputtering......
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...Plate Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target......
Baoji Feiteng Metal Materials Co., Ltd.
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets......
Shaanxi Peakrise Metal Co.,Ltd
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99.99% SiO2 Silicon Dioxide Sputtering Target Frosting Surface High Chemical Purity
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...Sputtering Target Natural quartz glass has excellent transmission in the UV range. Synthetic quartz glass (fused silica) is of the highest purity due to the special manufacturing process. This quartz glass has an extremely high purity and few inclusions and is therefore particularly advantageous for optical applications. We supply quartz glass plates......
Yantai ZK Optics Co., Ltd.
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Sputtering Aluminum Steam Blowing Target Plate For Steam Purge Test In Power Plant
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Sputtering Aluminum Target Plate For Steam Purge Test In Power Plant After the pipeline system is installed, air or steam can be used to blow it according to the working conditions of its working medium and the degree of contamination of the inner surface......
Hebei Zexu Pipe Manufacturing Co., Ltd.
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