Mo Metal Sputtering Target Molybdenum Sputtering Target

Molybdenum targets, a rising star in high-performance materials

With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation.

Excellent Properties of Molybdenum Targets

l Ultra-high Purity

Molybdenum targets typically have a high purity of ≥99.95%, with some reaching 5N (99.999%). Extremely low impurity content, such as Fe and Ni <50ppm, and O <200ppm, ensures stable electrical performance of sputtered films, laying a solid foundation for high-precision applications like semiconductor chip manufacturing.

l High-temperature Oxidation Resistance

With an ultra-high melting point of 2623℃, weight gain from oxidation in air at 1000℃ is <0.1mg/cm² (100 hours). For example, a photovoltaic company using Mo targets to prepare TCO films showed no failure after 500 hours under 85℃/85% RH testing, demonstrating outstanding stability in high-temperature and harsh environments.

l Precise Structure and Excellent Conductivity

Density: 10.28 g/cm³ (99% theoretical), grain size <50μm, flatness ≤0.05mm (Φ100mm target). Excellent conductivity of high-purity Mo (resistivity 5.2 μΩ·cm) ensures efficient current transfer during sputtering, improving sputtering efficiency. The precise structural design is compatible with high-precision sputtering equipment, ensuring coating accuracy and uniformity.

Applications of Molybdenum Targets

l Semiconductor Industry

Molybdenum targets are used in the semiconductor industry to prepare bottom electrodes for metal silicon wafers, providing stable current and ensuring wafer quality.

l Display Panels

Molybdenum target material is used in liquid crystal displays (LCDs) to enhance brightness, contrast, color, and lifespan.

l Photovoltaic Industry

Molybdenum targets are used in solar cell manufacturing as electrode materials, improving conversion efficiency.

l Low-emissivity Glass

Molybdenum targets are used in the production of STN/TN/TFT-LCDs and low-emissivity glass, suitable for various coating systems.

Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people.

APG specializes in the research and development (R&D) and production of PVD materials (sputtering targets and evaporation materials), pastes, and powders. These products serve industries such as PV solar cells, optics, semiconductors, smart touch and display manufacturing, Low-E glass production, permanent magnets, power batteries, and decorative and functional coating applications.

APG utilizes leading production technologies, including sintering, plasma spraying, and melting. The company produces ceramic materials, compound materials, metals, and alloy materials, and also provides bonding and backing plate services. APG possesses the necessary technology and equipment to produce both powder and pastes.

APG maintains a strong technical team and R&D department, which accounts for more than 20% of the company's total employees. This team focuses on developing new materials and technologies and holds numerous patents. Additionally, APG operates an inspection center equipped with various instruments to guarantee the stable quality of all products. APG is committed to the research, development, and production of high-performance materials and delivering excellent service to its customers.