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Halcon Circular Dot Calibration Board high positional accuracy For Camera Robotics

Categories Vision Calibration Target
Certification: ISO9001
Payment Terms: T/T
Specification: The precision can reach 1um, and the size can be customized up to 1.68*3500mm according to different materials
Brand Name: DFOPTIX
MOQ: 1
Material: Glass, Ceramic, Film, Aluminum Can Be Customized
Packaging Details: Carton boxes, plastic sponge boxes, customized wooden boxes, etc
Supply Ability: The average monthly production capacity for calibration plates and film is 300,000 pieces
Shipping Option: FedEx and UPS
Place of Origin: China
Delivery Time: 5 Work Days
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Halcon Circular Dot Calibration Board high positional accuracy For Camera Robotics

Halcon Calibration Board


Circular dot calibration board is a high-precision calibration tool designed for optical systems, ensuring optimal camera calibration, lens distortion correction, and system performance evaluation. Made using advanced photolithography technology, it offers exceptional accuracy with micron-level precision, making it ideal for high-resolution imaging systems and microscopic applications. Its durable, heat-resistant material guarantees long-term stability, and the precise dot pattern ensures uniformity across the entire board, delivering reliable calibration results. This board is fully customizable to meet various calibration needs, making it perfect for industrial cameras, robotics, and automated vision systems.

Product features: sharp edges, high positional accuracy, low expansion coefficient, High precision (with a maximum accuracy of 1um),and customization support.

Applicable scenarios: Machine vision calibration (security, film and television, medical, camera, drone camera, photography studio, scientific research instruments, and other equipment).

Base material: The base material of the dot calibration plate is optional, and different base materials (such as glass, ceramic, film, aluminum plate, etc.) can be customized according to different usage scenarios, environments, and accuracy requirements.

1. Glass substrate parameters:

Design

Substrate

Manufacturing Process

Photolithography

Glass substrate

Quartz glass (fused silica)/soda glass

Minimum line width

1µm / 0.55µm

Transmittance rate(@550nm)

>95%

Feature accuracy

±1µm

Coefficient of thermal expansion

(20-200°C)

<5.0×10⁻⁷/K

Coating

Yellow chromium, bright chromium

, blue chromium (low reflectivity)

Expansion ratio(20-200°C)

0.00006% (0.6µm/°C of 1m)

Reflectance

< 13.4% @550nm

Surface flatness

<0.55µm (length<50mm)

< 1.8% @650nm

<2µm (length<100mm)

< 2.67% @750nm

<5µm (length>100mm)

Coating accuracy

120nm (±0.20nm)

Surface roughness

<0.025µm

Optical density OD

Yellow Chromium 3 (Blue 5)

Thickness

1mm,1.6mm,2.3mm,3mm(±0.2mm)(500*500*4.8)

White background

Minimum line width:10µm

Minimum/maximum size

Min: 2×2 mm

White background thickness: 40 µ m

(smooth white coating on the back)

Max: 800×960mm (±0.1mm)

Positive & negative shapes

Positive: pattern opaque

Negative: pattern translucent

Appearance and shape

Square

2. Ceramic substrate parameters:

Design

Substrate

Manufacturing Process

Photolithography

Type

Matte chromium on matte ceramics

Bright chrome on glossy ceramics

Type

Matte ceramic

Glossy ceramic

Ceramic substrate

Zirconia / Alumina

Minimum line width

4µm

2µm

Thickness

1mm (±0.1mm, common)

2mm (common)

3mm (±0.1mm)

Feature accuracy

±2µm

±2µm

Surface flatness

<30µm (length<100mm)

<60µm (length<200mm)

Appearance accuracy

±0.05mm

±0.05mm

Surface flatness

MIN: 2×2mm (±0.1mm);

MAX: 228×228mm (±0.1mm)

Coating

Chromium

Chromium

Surface roughness

<0.2-0.7µm

Light coating/matte coating

Matte chromium coating

Bright chrome coating

Coefficient of thermal expansion

(40-400°C)

<6.7×10⁻⁶/K

ReflectaCnce

< 12.88% @550nm

< 9.56% @550nm

Unit weight

≥ 3.66 g/cm³

< 10.62% @650nm

< 1.89% @650nm

< 12.23% @750nm

< 11.168% @750nm

Coating thickness

100-120nm

100-120nm

Rockwell hardness

≥80 HRA

Positive and negative shapes

Positive film: opaque pattern,

Negative film: transparent pattern

Appearance and shape

Laser cutting of any shape

Square

Ellipse

Protective layer

The thin film above the chromium layer

makes the chromium pattern more durable

Special shape

Punch

Chamfer

Oblique angle

3. Film substrate parameters:

Design

Film substrate

Manufacturing Process

Lithography

(Film Lithography Machine)

Application

Used for transmission/backlight

/functional testing

Minimum line width

10 µ m/30 µ m optional

Coefficient of expansion

Film shrinks when heated and expands when cooled

Feature accuracy


±10µm

10µm/°C of 1m

When the relative temperature is constant,
When the humidity changes by 1 ° C,
A film with a length of 1m will change by 10 µ m (one ten thousandth)

Coating

Silver bromide

Transmittance rate(400~700nm)

>90% ultraviolet<(400~700nm)>infrared

Coating thickness

2µm

Film substrate thickness

0.18mm (±0.01mm)

Optical density OD

OD>4 when 100% black
(OD value controllable in grayscale)

Maximum size

0.71×0.81m (±0.1mm)(minimum line width 10µm)

1.68×3.5m (±0.1mm)(minimum line width 30µm)

color

Black grayscale,

sine grayscale

Appearance

Laser cutting, straight edge cutting, and circular hole hollowing are available


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