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UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride

Categories Specialty Gas Mixtures
Brand Name: Newradar Gas
Model Number: N/A
Certification: ISO/DOT/GB
Place of Origin: China
MOQ: 1000 liters
Price: negotiation
Payment Terms: L/C, , T/T, Western Union, MoneyGram
Supply Ability: 3,00 cubic meter per month
Delivery Time: 15-25 working days after received your payment
Packaging Details: 10kg, 40kg or 50kg packed in the qualified gas cylinder or packed according to the demands
Application: 248nm Lithography Process And Mixed With Halogen Using Mixed Gases
CAS No.: 7439-90-9
UN No: 1982
Purity:: 99.999%
Package:: seamless steel cylinders
Other Names: Oxygen Carbon tetrafluoride Mixture
Appearance:: Colorless Gas
Cylinders volume:: 10L,25L, 40L or 50L
Grade Standard: Electron Grade Grade
Toxic: non-toxic
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    UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride

    UN 1982 Specialty Gas Mixtures 20% Oxygen With Carbon Tetrafluoride


    Description:


    Specialty Gas Mixtures


    Carbon Tetrafluoride is a source of fluorine or carbon fluoride free radicals used in a variety of wafer etchprocesses. Carbon Tetrafluoride is used with oxygen to etch polysilicon, silicon dioxide, and silicon nitride.


    Carbon Tetrafluoride is relatively inert under normal conditions and is an asphyxiant. Under RF plasma conditions, the fluorine free radicals are typically in the form of CF3

    or CF2. A higher purity CarbonTetrafluoride results in superior control of the process, which results in better dimensional and profile control.


    Other halocarbons, as well as the presence of air or oxygen, are detrimental to the control of the anisotropic etch.


    Specifications:


    1. Physical properties


    Major Components
    COMPONENTSCONCENTRATIONRANGE
    O220 %19.9-20.1%
    CF4Balance

    2. Typical technical data (COA)


    Maximum Impurities
    COMPONENTSCONCENTRATION (ppm)
    Carbon Dioxide (CO2)<1.0
    Carbon Monoxide (CO)<1.0
    Moisture (H2O)<0.5
    Nitrogen (N2)<10.0
    Oxygen (O2)<5.0
    THC (as Methane) (CH4)<0.5
    Other Halocarbons<1.0
    Sulphur Hexafluoride<1.0

    Cylinder Specifications*ContentsPressure
    CylinderValve Outlet OptionsPoundsPSIGBAR
    2CGA 580DISS 716702000139

    Applications:


    1

    Tetrafluoromethane is sometimes used as a low temperature refrigerant.


    2

    It is used in electronics microfabrication alone or in combination with oxygen as a plasma etchant for silicon, silicon dioxide, and silicon nitride.


    3

    It also has uses in neutron detectors



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