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High purity Niobium sputtering target, Nb target for semicondutor industry

Categories Niobium metal
Place of Origin: china
Brand Name: Fitow
Certification: ISO9001-2008
Model Number: fm20150402
MOQ: 10pcs
Price: usd3-65/pc
Packaging Details: wooden case
Delivery Time: 12days
Payment Terms: T/T
Supply Ability: 1000pc/month
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    High purity Niobium sputtering target, Nb target for semicondutor industry

    high polished niobium target for sputtering coating

    machined smoothing surface round circle sphere niobium Sputtering targets Standard ASTM B393

    Dimension Φ(25-400)mm*(3-40)mm
    Material RO4200-1, RO4210-2, Nb1Zr, Nb10Zr
    Shape Circular
    Size Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
    Rectangular targets Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm
    Purity >=99.95% or 99.99%

    Designation:Nb1,Nb2

    Dimension:Dia1.5-20*<200*L mm;Dia80-100*L m
    Application:coating film

    Grade:Nb1 Nb2 Nb3 Nb4, FNb1 FNb2, NbHf10-1
    Shape: rectangle, circular, rotatable
    Purity: 99.95%,

    Products Features: high corrosion resistance, high melting point, high hardness and strength ,

    Application nuclear reaction, nuclear field.


    Detailed introduction to Niobium Sputtering Target:

    Niobium Sputtering Target
    thickness 6,9,12,18 mm

    Purity: 99.9%, 99.95%

    Shape: rectangle, circular, rotatable

    Construction for rectangle target: single piece or multiple pieces with butt or beveled jointed

    Competitive pricing, stable quality, quick delivery

    Chemical Element (weight %, max.)

    UNS

    Type

    C

    O

    N

    H

    Ta

    Fe

    Ti

    W

    Mo

    Si

    Ni

    Zr

    Nb

    R04210

    Pure

    0.004

    0.015

    0.003

    0.0015

    0.05

    0.004

    0.002

    0.005

    0.005

    0.004

    0.002

    /

    Bal.

    R04261

    Nb-Zr

    0.004

    0.015

    0.003

    0.0015

    0.05

    0.004

    0.002

    0.005

    0.005

    0.004

    0.002

    1.00

    Bal.

    /

    Nb-Zr

    0.004

    0.015

    0.003

    0.0015

    0.05

    0.004

    0.002

    0.005

    0.005

    0.004

    0.002

    10.0

    Bal.

    Hengxin Metal supply kinds of metal & alloy sputtering target for various industries in a wide range of shapes and sizes.

    Metals & alloys

    Chromium

    Hafnium

    Molybdenum, Mo-Nb, Mo-Ti, Mo-W

    Nickel, Ni-Cr, Ni-V

    Niobium, Nb-Ti, Nb-Zr

    Tantalum, Ta-W

    Titanium, Ti-Al, Ti-Cr, Ti-Cu, Ti-Pd

    Tungsten, W-Ag, W-Re

    Zirconium, Zr-Ti

    Purity: 99%-99.999%, dependant on different materials

    Shape and form:

    Square, rectangle, circular, triangular, rotatable

    Single piece or multiple pieces construction. Jointed by butt or beveled for multi-segmented targets.

    OEM design available

    Buy High purity Niobium sputtering target, Nb target for semicondutor industry at wholesale prices
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